Mask work

In Section 901 of the U.S. copyright law, a mask work is "a series of related images, however fixed or encoded &mdash;
 * (A)having or representing the predetermined, three-dimensional pattern of metallic, insulating, or semiconductor material present or removed from the layers of a semiconductor chip product; and


 * (B)in which series the relation of the images to one another is that each image has the pattern of the surface of one form of the semiconductor chip product."